XPM- workshop on Industrial AI 2023

Hôtel de La Poste – Antsiranana, Diego Suarez 201, Madagascar 28 – 29 November, 2023


The XPM-workshop on Industrial AI (XWAI 2023) will take place between November 28 – 29, 2023 in Antsiranana, Madagascar. This workshop aims to bring together researchers and practitioners from the industry as well as academics seeking to conduct applied maintenance research to present their latest achievements and innovations in the field of industrial AI for the development of advanced techniques in reliability, maintainability and supportability, and this in the context of Industry 4.0 and Industry 5.0.

Topics of interest include (but are not limited to):

Data and information fusion in the industrial XAI context,

Explainable systems fusing various sources of industrial information,

Exploring XAI in the performance and efficiency of industrial systems,

XAI for predictive maintenance,

Explainable anomaly detection,

Root Cause Analysis, Causal Reasoning,

Automatic process optimization,

Industrial process monitoring and modelling,

Visual analytics and interactive machine learning,

Decision-making assistance and resource optimization

Planning under uncertainty,

Digital Twins for Predictive Maintenance,

Analysis of usage patterns,

AI transparency and accountability in smart factories

Industrial use cases for XAI (e.g., manufacturing, energy, transport),

Challenges and future direction for XAI in the industry

Remaining Useful Life,

Ethical considerations in industrial deployment of AI,

Forecasting of product and process quality.

::Submission Deadline:: October 30, 2023

For the workshop track, please submit your manuscript via CMT at:

IMPORTANT: When creating a new submission on CMT, please ensure you choose the « Workshop » track.

The Latex submission template and style file can be found here:

Accessing the templates:

Microsoft Word

  • US letter (DOC, 30 KB) Updated Jan 2019
  • A4 (DOC, 30 KB) Updated Jan 2019

LaTeX Template Instructions (PDF, 63 KB) [Be sure to use the template’s conference mode.]


Manuscripts must be written in English, be a maximum of 6 pages (including references, appendices, etc.) and follow the Ieeeconf style. If required, supplementary material may be submitted as a separate file, but reviewers are not obliged to consider this.

It is not appropriate to submit papers that are substantially similar to versions that have been previously published, or accepted for publication, or that have been submitted in parallel to other conferences or journals. However, submission is permitted for papers presented or to be presented at conferences or workshops without proceedings, or with only abstracts published. Also, submission is permitted for papers that are available as a technical report (e.g., in arXiv) as long as it is not cited in the submission.

:: Call for papers ::